Substrate storage container

ABSTRACT

A substrate storage container includes a container body for accommodating and aligning semiconductor wafers, a door which opens and closes the front of the container body and a pair of valve units disposed at the bottom of the container body for controlling gas flow. Each valve unit includes a fixed sleeve for gas flow, fitted in a rib of a through-hole of the container body, a holding sleeve fitted in the through-hole of the container body with an o-ring interposed therebetween and mated and threaded with the fixed sleeve, a check valve built between the fixed sleeve and the holding sleeve, leaving a clearance, an elastically deformable element for opening and closing the check valve, an interior lid sleeve for gas flow, opposing the check valve and supporting the elastically deformable element, and a filter interposed between the holding sleeve and the interior lid sleeve.

TECHNICAL FIELD

The present invention relates to a gas-purgeable, substrate storagecontainer for storing substrates such as semiconductor wafers, photomaskglass, and detailedly relates to a valve unit for gas purging, forcontrolling the gas flow, both into and from, the substrate storagecontainer.

BACKGROUND ART

In the recent semiconductor industry, as seen in the case of DRAM(Dynamic Random Access Memory) production, while there has beencompetition for acquisition of market-share due to cost reduction ofsemiconductor devices, revision of the production system, for costreduction, as well as development of semiconductor wafers used forproduction of semiconductor devices into large sizes (300 mm or greater)have been in progress.

As to the revision of the production system, there is an example wherethe system in which the whole semiconductor manufacturing plant is keptas a highly clean environment (e.g. class 10 clean or above) tomanufacture semiconductor devices is transferred to the system in whichmultiples processing steps of semiconductor wafers are divided intosections, each interior space being maintained to be highly clean whilesemiconductor wafers are conveyed by substrate storage containersbetween the processing steps.

According to such a new system, the installation cost for clean roomconstruction as well as the running cost for its maintenance can besharply cut down, and yet with increased production yield in thesemiconductor device manufacturing.

The standards of the substrate storage containers used in thesemiconductor production plant using this new system are specified bySEMI standards (E19, E47.1, E62, E63 and others), so that the containerhas a conveyance device for automated in-plant transportation and a doorin compliance with FIMS, which can be attached and removed byautomation. Further, the substrate storage container is demanded to havehigh hermetic sealing property for avoiding contamination of thesemiconductor wafers and also, in order to keep the interior of thecontainer body clean it should be formed using clean material that emitsa lower amount of volatile gases.

The minimum conductor width of electronic circuits formed onsemiconductor devices tends to be smaller and smaller (0.01 μm orbelow). In order to facilitate this, it is necessary to prevent thesurfaces of the semiconductor wafers held in the substrate storagecontainer from being formed with a natural oxide film and beingcontaminated with organic matter. As a countermeasure against this,there is a method called the gas purge (replacement) technique, whichdrives out the interior of the substrate storage container with an inertgas such as nitrogen or dry air with moisture removed (equal to or below1%).

With regard to this, some techniques have been proposed: a filter isattached by providing a partial opening in the substrate storagecontainer; or valves such as check valves, etc., are provided at theperiphery of the opening so as to achieve gas purging (see JapanesePatent Application Laid-open Hei 11 No. 191587 and Japanese PatentApplication Disclosure 2002-510150).

The conventional substrate storage containers, which are constructed andgas purged as above, suffer from the following problems.

First, in the case where gas purge is performed with a valve attached tothe substrate storage container, an engagement structure for valveattachment is needed. However, this engagement structure increases thecomplexity of the arrangement. An ordinary valve has a hollow portionwith a narrow opening, and a shutoff valve that closes this opening isprovided to come into contact with a tapered portion of the opening,creating a sealing structure. This shutoff valve is readily displaced byrepeated usage, resultantly presenting a leakage problem due toimperfect seal. Further, since the ordinary valve incorporates more thana few metallic parts such as a spring for valve control and the like,there is a fear that a very small quantity of metal ions, dischargedfrom the metal parts while the substrate storage container is put instorage or during its cleaning, infiltrates into the substrate storagecontainer, contaminating semiconductor wafers.

On the other hand, in the case where a filter is merely attached to thesubstrate storage container, gas purge can be done with a simpleconfiguration. In this case, however, there is a problem in that thepurging gas charged through the filter, however, cannot be kept insidethe substrate storage container. Therefore, the gas in the substratestorage container can easily leak out, so that the gas purge effect canbe maintained in only a short period. There is also a problem in that itis impossible to effectively prevent a trace amount of organic matter inthe clean room from flowing into the interior of the substrate storagecontainer from exterior because there is a passage between inside andoutside of the substrate storage container.

DISCLOSURE OF INVENTION

In view of the above, it is an object of the present invention toprovide a substrate storage container in which the engagement structurefor valve attachment can be simplified, which can prevent displacementof the valve due to repeated usage and hence prevent incomplete sealingand which is free from the risk of traces of discharged metal ionscontaminating the substrates. It is also another object to enablerelatively long-term holding of purging gas and to efficiently preventinflow of contaminant from the outside to the inside of the container.

In order to attain the above objects, the present invention according toClaim 1 is a configuration including: a container body; a door foropening and closing the container body; a valve unit attached to athrough-hole formed in, at least, one of the container body and thedoor, for regulating the gas flow with respect to the container body,and is characterized in that the valve unit comprises: a fixed sleevefor gas flow, fitted in the through-hole; a holding sleeve for gas flow,mated with the fixed sleeve; an elastic check valve built in between thefixed sleeve and the holding sleeve; and an interior lid sleeve for gasflow, opposing the elastic check valve, and one of the fixed sleeve andthe interior lid sleeve is adapted to be opened and closed by theelastic check valve, so that gas will pass through when the elasticcheck valve is open while gas will be prevented from passing when theelastic check valve is closed.

It is preferred that a through-hole is formed in the bottom of thecontainer body, and the valve unit as a gas inlet valve or gas dischargevalve is fitted to the through-hole.

Further, it is possible that a rib is formed and extended outward fromthe periphery of the through-hole and the fixed sleeve is formed with aflange that is in contact with the periphery of the rib while theholding sleeve is formed with a flange that is in contact with theperiphery of the through-hole.

It is also preferred that a clearance for gas flow is formed at leastbetween the holding sleeve and the periphery of the elastic check valve.

It is also preferred that the interior lid sleeve is fitted in theholding sleeve with an air filter interposed therebetween.

Further, it is possible that the elastic check valve is at least made upof a check valve that is built in the fixed sleeve, leaving a clearance,and an elastically deformable element interposed between the check valveand the interior lid sleeve, and the opening of the fixed sleeve isadapted to be opened and closed by the check valve, so that gas willpass through when the check valve is open while gas will be preventedfrom passing when the check valve is closed.

It is also possible that the elastic check valve is at least made up ofa check valve that is built in the fixed sleeve, leaving a clearance,and an elastically deformable element interposed between the check valveand the fixed sleeve, and the opening of the interior lid sleeve isadapted to be opened and closed by the check valve, so that gas willpass through when the check valve is open while gas will be preventedfrom passing when the check valve is closed.

It is also possible that the elastic check valve is at least made up ofa check valve that is built in the fixed sleeve, leaving a clearance,and an elastically deformable element for the check valve, and eitherthe check valve or the elastically deformable element is made in contactwith the interior lid sleeve, so that gas will pass through when thecheck valve is open while gas will be prevented from passing when thecheck valve is closed.

It is possible that a guide element is provided for either the checkvalve of the elastic check valve or the interior lid sleeve while aguided part is provided for the other, so that the guide element and theguided part fit to each other in a slidably manner.

It is further possible that the guide element is formed in the interiorlid sleeve so as to have an approximately convex-top section while theguided part is formed in the check valve of the elastic check valve soas to have an approximately concave-top section.

It is also possible that a sealing element is attached to the checkvalve of the elastic check valve, and the sealing element is placed intodeforming contact with the opening of the fixed sleeve or the interiorlid sleeve to seal.

It is possible that a through-hole is formed in the bottom of thecontainer body, and a hollow nozzle tower communicating with the valveunit is made to stand, the peripheral wall thereof being formed with gasejection holes.

It is also possible that a through-hole is formed in the bottom of thecontainer body, and a deflecting plate is attached in the vicinity ofthe hole, the deflection plate being formed having an approximatelyL-shaped section with its longer part opposed to the valve unit with agap therebetween.

Further, it is possible that the elastic check valve is at least made upof a check valve that is built in the fixed sleeve, leaving a clearanceand an extensible bellows fitted in the check valve, the peripheral wallof the bellows is formed with a passage opening, and the check valve canbe opened and closed by the extension and compression of the bellows.

Moreover, it is possible that the elastic check valve is at least madeup of a check valve that is built in the fixed sleeve, leaving aclearance and an elastic skirt body integrated with the check valve, apassage opening is formed in the check valve, an approximatelycylindrical skirt piece is flexibly extended from the rim of the skirtbody and is fitted on the periphery of the check valve, and the checkvalve can be opened and closed by the deformation of the skirt body.

Here, the container bodies within the range of the claims are mainly ofa front-open box type. However, a top-open, bottom-open or side-opentype may be used. Also, whether it is transparent or opaque is notparticularly limited. This container body accommodates a single or amultiple number of substrates or the like such as semiconductor wafers,photomask glass, etc. The gas is usually inert gas or dry air, but isnot particularly limited.

Also, the valve units may be attached to the through-holes in both thecontainer body and the door, or may be the through-holes in either thecontainer body or the door. One or plural valve units may be used. Theelastic check valve can be formed of a single part or made up ofseparate parts, i.e., a check valve and an elastically deformableelement. A single or multiple sealing elements may be attached to thecheck valve, so that the sealing element(s) is placed into deformingcontact with the fixed sleeve or the interior lid sleeve. Theelastically deformable element may be built in the holding sleeve,leaving a clearance therebetween, but not necessary so. Further, theinterior lid sleeve may be supported by the holding sleeve by anengaging means made up of concave and convex shapes.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a perspective exploded view showing the embodiment of asubstrate storage container according to the present invention.

FIG. 2 is a bottom view showing a container body in the embodiment of asubstrate storage container according to the present invention.

FIG. 3 is a perspective exploded view showing a valve unit, cut along achain line I-I in FIG. 1, in the embodiment of a substrate storagecontainer according to the present invention.

FIG. 4 is a sectional illustrative view showing a gas inlet valve in theembodiment of a substrate storage container according to the presentinvention.

FIG. 5 is a sectional illustrative view showing the gas inlet valve,shown in FIG. 4, to which gas is supplied.

FIG. 6 is a sectional illustrative view showing a gas discharge valve inthe embodiment of a substrate storage container according to the presentinvention.

FIG. 7 is a sectional illustrative view showing the gas discharge valve,shown in FIG. 6, from which gas is discharged.

FIG. 8 is an illustrative plan view showing a jig for gas purge in theembodiment of a substrate storage container according to the presentinvention.

FIG. 9 is a side view showing the jig for gas purge in FIG. 8 in itsusage state.

FIG. 10 is a sectional illustrative view showing a gas inlet valve inthe second embodiment of a substrate storage container according to thepresent invention.

FIG. 11 is a sectional illustrative view showing a gas discharge valvein the second embodiment of a substrate storage container according tothe present invention.

FIG. 12 is a perspective exploded view showing the third embodiment of asubstrate storage container according to the present invention.

FIG. 13 is a bottom view showing a container body in the thirdembodiment of a substrate storage container according to the presentinvention.

FIG. 14 is a perspective exploded view showing a valve unit, cut along achain line II-II in FIG. 12, in the third embodiment of a substratestorage container according to the present invention.

FIG. 15 is a sectional illustrative view showing a gas inlet valve inthe third embodiment of a substrate storage container according to thepresent invention.

FIG. 16 is a sectional illustrative view showing the gas inlet valve,shown in FIG. 15, to which gas is supplied.

FIG. 17 is a sectional illustrative view showing a gas discharge valvein the third embodiment of a substrate storage container according tothe present invention.

FIG. 18 is a sectional illustrative view showing the gas discharge valveshown in FIG. 17, from which gas flows out to the outside.

FIG. 19 is a partial sectional illustrative view showing the fourthembodiment of a substrate storage container according to the presentinvention.

FIG. 20 is a partial sectional illustrative view showing the fifthembodiment of a substrate storage container according to the presentinvention.

FIG. 21 is a sectional illustrative view showing a gas inlet valve inthe sixth embodiment of a substrate storage container according to thepresent invention.

FIG. 22 is a sectional illustrative view showing a gas discharge valvein the sixth embodiment of a substrate storage container according tothe present invention.

FIG. 23 is a sectional illustrative view showing a gas discharge valvein the seventh embodiment of a substrate storage container according tothe present invention.

FIG. 24 is a sectional illustrative view showing a gas inlet valve inthe seventh embodiment of a substrate storage container according to thepresent invention.

BEST MODE FOR CARRYING OUT THE INVENTION

The preferred embodiment of the present invention will be describedhereinbelow with reference to the drawings. The substrate storagecontainer of the present embodiment is comprised of, as shown in FIGS. 1to 7, a container body 1 for accommodating and aligning a plurality ofsemiconductor wafers W in horizontal layers along the verticaldirection, a door 10 which is removably attached to the front opening ofthe container body 1 to open and close it, and a pair of valve units 20disposed in the bottom of container body 1 for controlling gas flow withrespect to container body 1. Of the pair of valve units 20, one valveunit 20 is used as a gas inlet valve 20A, the other valve unit 20 as agas discharge valve 20B.

As the semiconductor wafers W, 25 or 26 pieces of 300 mm silicon wafers,for example, may be accommodated therein.

As shown in FIG. 1, container body 1 is formed as a front-open box type,having an opening on one side or on the front, using polycarbonate orthe like, added with carbon fibers, conductive polymers or the like soas to present conductivity. Provided on both the interior sides aresupporting structures (not shown) for supporting the rims ofsemiconductor wafers W at both sides by supporting pieces. As shown inFIG. 2 an approximately Y-shaped, in plan view, bottom plate 2 havingthrough-holes for detection and discrimination of the substrate storagecontainer type is removably attached to the bottom of this containerbody 1. This bottom plate 2 has positioning members 3 having anapproximately V-shaped section and arranged at both sides in front andone in the rear for positioning with respect to processing equipment.Other than these plurality of positioning members 3, bottom plate 2 hasthrough-holes for attachment of an identification maker and clamp holesfor fixture to the container body are bored, respectively.

Formed on both sides on the front part of the bottom of the containerbody, or in other words, in the area not overlapping the projected areaof semiconductor wafers W, are round through-holes 4, respectively, asshown in FIGS. 1 to 3. At the periphery of each through-hole 4, acylindrical rib 5 externally projected downwards is integrally formed. Ahandle 6 is removably attached to the top of container body 1. Thishandle 6 is held by an automaton called OHT (overhead hoistingtransfer), whereby the substrate storage container is transferred fromone step to another. A wide rim portion 7 for door fitting is integrallyformed around the periphery of the front opening of container body 1.Formed in the interior of the rib portion 7 at both the top and bottomare hollow, door engagement slots 8. A pair of carrying handles 9 formanual handling are removably attached externally on both side ofcontainer body 1.

Door 10 is formed in a laterally long, approximately rectangular shapewith four rounded corners, and incorporates an unillustratedinterlocking mechanism. This interlocking mechanism includes a multiplenumber of retractable engagement prongs, which can project and retractfrom retraction holes 11 on the peripheral wall, and project and fitinto engagement slots 8 of rim portion 7, so that the door 10 fitted tocontainer body 1 will be tightly closed. A stepped portion that fits rimportion 7 of container body 1 is projectively formed on the rear side ofdoor 10. Attached in a removable manner to this stepped portion is afront retainer 12 for supporting and aligning multiple semiconductorwafers W in their horizontal position with a predetermined pitch alongthe vertical direction. An endless gasket 13 for seal with containerbody 1 is fitted on the peripheral wall of door 10.

Here, container body 1, bottom plate 2, handle 6, carrier handles 9 anddoor 10 are formed of thermoplastic resin such as, for example,polycarbonate, polyetherimide, polyetheretherketone, cyclic olefinepolymer (COP), or one of these added with conductivity.

As shown in FIG. 3 and others, each valve unit 20 is constructed of afixed sleeve 21 that is removably attached to rib 5 of through-hole 4 ofcontainer body 1 from below and forms the gas flow passage, a holdingsleeve 25, removably attached to through-hole 4 of container body 1 fromabove with an O-ring 31 for seal interposed therebetween and screwfitted with fixed sleeve 21, a check valve 32 built in for defining aclearance 33 between the fixed sleeve 21 and holding sleeve 25, anelastically deformable element 36 for opening and closing this checkvalve 32, an interior lid sleeve 37 that opposes check valve 32 andholds elastically deformable element 36 and forms the gas flow passage,and a disk-shaped filter 42 interposed between holding sleeve 25 andinterior lid sleeve 37. Check valve 32 and elastically deformableelement 36 constitute an elastic check valve, which controls gas flowfrom fixed sleeve 21 to holding sleeve 25.

As shown in FIGS. 3 to 7, fixed sleeve 21 is basically a cylinder with abase, formed using polycarbonate, polyetherimide, polyetheretherketone,or the like, with a threaded groove 22 incised for fastening formed onthe inner periphery thereof. This fixed sleeve 21 has a round vent port23 formed at the bottom center for creating a gas flow passage. Anannular flange 24 extending radially outwards is formed around the outerperiphery at the bottom. This flange 24 abuts from below against the rimof the opening of rib 5.

As shown in FIGS. 3 and 4, holding sleeve 25 is basically formed of thesame resin as fixed sleeve 21, for example, in a cylindrical shape thatis formed in a size smaller to snugly fit into fixed sleeve 21. In theopening top, sectioning ribs 27 for sectioning the opening into multiplevents 26 for gas flow passage are formed in a lattice-like or radialconfiguration. The underside of these sectioning ribs 27 serve as anabutment face 28 having a corresponding shape to a filter 42 andreceiving it. This holding sleeve 25 has an annular flange 29 thatextends radially outwards from the upper peripheral side. This flange 29comes into contact from above with the rim of through hole 4. A thread30 for fastening is formed on the outer periphery of holding sleeve 25so that this thread 30 will mesh with threaded groove 22 of fixed sleeve21.

O-ring 31 is disposed between through-hole 4 and the outer periphery ofholding sleeve 25 to effectively prevent infiltration of gas intocontainer body 1 and gas leakage from container body 1.

Check valve 32, as shown in FIGS. 3 to 7 and others, is formed in adisk-like configuration having an approximately plate-shaped section oran approximately hat-like section, using predetermined material based onthe usage of valve unit 20, and is fitted and placed on the interiorbase of fixed sleeve 21 so as to cover the round vent port 23 and defineclearance 33 as gas flow passage in cooperation with the inner peripheryof holding sleeve 25. As the material for this check valve 32,polyethylene, polypropylene, polycarbonate, cyclic polyolefin polymer,thermoplastic polyester elastomer can be referred to, for example. Aguided part 34 having an approximate concave-top section for preventingdisplacement is projectively formed from the center of the check valve32 surface while an endless sealing element 35 is fitted along theperiphery on the undersurface. This sealing element 35 provides thefunction of a sealing contact, by deformation, with the inner base offixed sleeve 21.

Sealing element 35 is an O-ring, for example, or an elastic ring formedof fluoro rubber, NBR rubber, urethane rubber, EPDM rubber, siliconerubber or the like, coated with fluorine or silicone on the surfacethereof, as appropriate. When formed with metal, the surface is coatedwith resin. When valve unit 20 is used as a gas discharge valve 20Binstead of its usage as a gas inlet valve 20A as shown in FIGS. 4 and 5,this sealing element 35 is fitted to the stepped periphery on thesurface side of check valve 32 and pressed against the opening rim ofinterior lid sleeve 37, as shown in FIGS. 6 and 7.

When valve unit 20 is used as a gas inlet valve 20A, the thusconstructed check valve 32 covers vent port 23 of fixed sleeve 21 by theelastically repulsive action of elastically deformable element 36, asshown in FIG. 4. On the other hand, when valve unit 20 is used as a gasdischarge valve 20B, the check valve and elastically deformable element36 are arranged upside down, and is placed on and supported byelastically deformable element 36 and pressed against the opening rim ofinterior lid sleeve 37 (see FIGS. 6 and 7).

Elastically deformable element 36 is comprised of a coil spring formedof SUS, synthetic resin or the like, and is disposed between guided part34 of check valve 32 and interior lid sleeve 37 or between the inside ofcheck valve 32 and fixed sleeve 21. This elastically deformable element36, in most cases, employs a coil spring shown in the drawings, but isnot limited to this. Elastic rubbers, elastomers, foamed materials, leafsprings and the like can also be used. Further, coil springs with theirsurface coated with a synthetic resin or elastomer can be used. In thiscase, discharge of a trivial amount of metal ions can be preferablyprevented.

When valve unit 20 is used as a gas inlet valve 20A, the elasticallydeformable element 36 is fitted to the recessed surface side of checkvalve 32 as seen in FIGS. 3 to 5. When valve unit 20 is used as a gasdischarge valve 20B, the elastically deformable element is arrangedupside down with respect to check valve 32 and placed at the peripheryof vent port 23 of fixed sleeve 21 (see FIGS. 6 and 7).

Interior lid sleeve 37 is basically formed in a cylindrical shape, asshown in FIGS. 3 to 7, of the same material as fixed sleeve 21, withsectioning ribs 39 for sectioning its top opening into multiple vents 38for gas flow passage in a lattice-like or radial configuration, and isheld in holding sleeve 25 and placed in contact with elasticallydeformable element 36. This interior lid sleeve 37 is fitted andsupported by means of a concavo-convex mating structure into holdingsleeve 25 while an O-ring 40 for sealing is disposed between theinterior lid sleeve and the upper interior part of holding sleeve 25. Aguide element 41 having an approximate convex-top section for assemblyconvenience and limiting displacement is projectively formed from thecenter of the undersurface of sectioning ribs 39 of interior lid sleeve37. This guide element 41 slidably mates into guided element 34. Oneexample of the concavo-convex mating structure can be constructed suchthat a slot formed on the inner periphery of holding sleeve 25 or on theouter periphery of interior lid sleeve 37 may be engaged with aprojection to fit into the slot, formed on the outer periphery ofinterior lid sleeve 37 or on the inner periphery of holding sleeve 25.

When valve unit 20 is used as a gas inlet valve 20A, this interior lidsleeve 37 is in contact with elastically deformable element 36, while,when valve unit 20 is used as a gas discharge valve 20B, this interiorlid sleeve 37 is in contact with elastically deformable element 36, itsopen bottom is pressed against the peripheral part of check valve 32with sealing element 35 in between (see FIGS. 6 and 7).

Filter 42 is composed of a molecular filter consisting oftetrafluoroethylene, polyester fiber, porous Teflon (registeredtrademark) film and glass fiber and/or a chemical filter in whichchemical adsorbents are deposited on filter media such as activatedcarbon fiber and the like. A single or multiple number of filters areinterposed and held between abutment face 28 of holding sleeve 25 andsectioning ribs 39 of interior lid sleeve 37 so as to cover the vents 38of interior lid sleeve 37. A protective member made of polypropylene,polyethylene or the like is laminated as appropriate over the front andrear sides of filter 42.

When a multiple number of filters 42 are employed, the same type offilters may be used or different types of filters may be used. Forexample, if a molecular filter and a chemical filter are used incombination, organic gas contamination in addition to particlecontamination of wafers W can be prevented.

Though assembly of valve unit 20 may be done by thread joint, anotherjoint may be used alone or in combination with thread joint. Forexample, a recessed portion may be formed in one of fixed sleeve 21 andholding sleeve 25 while a projected portion may be formed in the other,so that these recess and projection can mate each other to completefixture. It is also possible to form a recessed portion in one ofholding sleeve 25 and interior lid sleeve 37 and a projected portion inthe other, so that these recess and projection can be mated to eachother to complete fixture.

Gas purge of the substrate storage container having the thus configuredvalve units 20 is carried out during being docked to the dooropening/closing machine (load port or door opener), during storage atthe stocker, during engagement in the process and/or during conveyanceon the way to the stocker. For this purpose, if the machine side isequipped with a gas purge jig 60 and the substrate storage container isset to the gas purge jig 60, smooth, efficient and easy performance ofgas purging can be expected.

Gas purge jig 60 may be configured of, as shown in FIGS. 5 and 7 to 9,for example, a housing body 62 having substrate storage containerpositioning pins 61 laid out in an approximate Y-arrangement, an airfeed nozzle 63 disposed in the housing body 62 and connected to onevalve unit 20, an air discharge nozzle 64 disposed in housing body 62and connected to another valve unit 20, an air feed path built inhousing 62 for connection between air feed nozzle 63 and a gas feedsource and an air discharge path built in housing 62 for connectionbetween air discharge nozzle 64 and a discharge device.

For air feed nozzle 63 and air discharge nozzle 64, seal forming meansfor prevention against gas leakage is formed appropriately around theirprojected portions. For example, air feed nozzle 63 is configured sothat it projects from the contact surface of housing body 62 so as to beconnected to valve unit 20 when it is used and it sinks in to housingbody 62 so as to flatten the contact surface of housing body 62 when itis not used.

In the above configuration, when the valve unit 20 is used as a gasinlet valve 20A and no gas such as an inert gas or the like is fed fromthe outside into the substrate storage container interior, check valve32 of gas inlet valve 20A is pressed against the interior bottom face offixed sleeve 21 via sealing element 35 by the repulsive force ofelastically deformable element 36 so as to close vent port 23,completing a sealed state (see FIG. 4).

In contrast, when a gas such as an inert gas etc., is fed from air feednozzle 63 of gas purge jig 60 to gas inlet valve 20A, the pressure ofthe gas ejected from air feed nozzle 63 urges check valve 32 of gasinlet valve 20A toward interior lid sleeve 37, compressing elasticallydeformable element 36 in the same direction, whereby check valve 32forms a gap with respect to vent port 23 of fixed sleeve 21, releasingthe sealed state (see FIG. 5). This cancellation of the sealed statecauses gas to flow from the substrate storage container exterior,passing through the clearance 33 between vent port 23 of fixed sleeve 21and check valve 32, the gap, interior lid sleeve 37 and filter 42, inthe order mentioned, into the interior of the substrate storagecontainer.

On the other hand, when the valve unit 20 is used as a gas dischargevalve 20B, elastically deformable element 36 of gas discharge valve 20Bpresses check valve 32 over sealing element 35 and toward and againstthe opening rim of interior lid sleeve 37, forming a sealed state.

In contrast, when the substrate storage container interior is filled upwith a gas, the pressure of the filling gas presses check valve 32 ofgas discharge valve 20B toward fixed sleeve 21, expanding elasticallydeformable element 36 in the same direction, forming clearance 33between check valve 32 and interior lid sleeve 37 to cancel the sealedstate. This cancellation of the sealed state causes gas to flow out fromthe substrate storage container interior, passing through filter 42,interior lid sleeve 37, the clearance between check valve 32 andinterior lid sleeve 37, the gap and vent port 23 of fixed sleeve 21, inthe order mentioned, to the outside of the substrate storage container.In this case, gas purge can be efficiently done if air discharge nozzle64 of gas purge jig 60 is connected to gas discharge valve 20B so as toreduce the pressure.

According to the above configuration, it is possible to create a firmengagement structure which is free of possible dislodgment by abuttingflanges 24 and 29 of fixed sleeve 21 and holding sleeve 25 mating eachother, against through-hole 4 and rib 5 of container body 1. Therefore,the configuration of the engagement structure can be made simple, andstill the metallic mold for container body 1 can be simplified. Further,since guided part 34 and guide element 41 mate each other, providing thefunction of controlling positional displacement, check valve 32 canoperate stably never causing positional displacement even with repeateduse. Accordingly, it is possible to provide an efficient solution to theproblem whereby leakage occurs due to imperfect sealing hence beneficialgas purge can be expected. Further, since valve unit 20 does not need toincorporate a number of metallic parts, it is possible to inhibit atrace amount of metal ions from being released from such a metal partwhen the substrate storage container is kept in storage or washed, andit is also possible to expect simplification and cost reduction of valveunit 20.

Moreover, fitting of a sealing element 35 to check valve 32 at theperipheral part of the front or rear surface, as appropriate so that itwill be pressed in the perpendicular direction, makes it possible forvalve unit 20 to be effectively used as a gas inlet valve 20A or as agas discharge valve 20B. As a result, it is possible to lengthen theretention duration of the replaced gas in the interior of the substratestorage container, hence maintain the gas purge effect for a longperiod. Also, since the clearance 33 between holding sleeve 25 and theperiphery of check valve 32 can be made wide open, efficient gas purgecan be greatly expected. Further, since valve unit 20 incorporatingfilter 42 is attached to the substrate storage container, the filter 42is not only effective in gas purging but also in retaining the purginggas in the substrate storage container interior. Accordingly, the gaswill not readily flow outside from the substrate storage container,hence it is possible to maintain the gas purge effect for a prolongedperiod of time. Moreover, since provision of valve units 20 allow forindirect communication between the interior and exterior of thesubstrate storage container, it is possible to almost perfectly preventthe organic matter that trivially exists in the clean room frominfiltrating into the inside from the outside of the substrate storagecontainer.

Next, FIGS. 10 and 11 show the second embodiment of the presentinvention. In this case, a check valve 32A is constructed so as to beused both in a gas inlet valve 20A and in a gas discharge valve 20B.

Check valve 32A basically is a solid form having an approximatelyconvex-top section, with a pair of round holes for guided parts 34,formed at the center thereof in both the front and rear sides. Anannular sealing element 35 is fitted along the periphery of theunderside. The check valve is formed marginally smaller than the insidediameter of an interior lid sleeve 37. A pair of guided parts 34, notbeing connected to each other, have a partition therebetween. When thevalve is used as a gas inlet valve 20A, this check valve 32A is set withits projected portion up, as shown in FIG. 10. When the valve is used asa gas discharge valve 20B, the check valve is set upside down as shownin FIG. 11.

Interior lid sleeve 37 basically has a configuration similar to that ofthe above embodiment, however, an annular sealing element 35 that willbe in contact with the periphery of check valve 32A or sealing element35, is additionally bonded to the interior ceiling of the interior lidsleeve. Other components are the same as in the above embodiment so thatdescription is omitted.

Also in this embodiment, the same operation and effect as that in theabove embodiment can be expected. In addition, since common parts can beused, it is no longer necessary to provide plural types of check valves32A depending on the usage of valve units 20. Accordingly, it isevidently expected that assembly work and management can be greatly madeefficient.

Here, a grooved hole may be formed along the periphery on each of boththe front and rear sides of check valve 32A so that a sealing element 35is selectively fitted into these paired grooved holes.

Next, FIGS. 12 to 18 show the third embodiment of the present invention.In this case, each valve unit 20 is constructed of a fixed sleeve 21that is removably attached to rib 5 of a through-hole 4 of a containerbody 1 from below and forms the gas flow passage, a holding sleeve 25,removably attached to through-hole 4 of container body 1 from above withan O-ring 31 for sealing interposed therebetween and screw fitted withfixed sleeve 21, an elastic check valve 32B built in for defining aclearance 33 between the fixed sleeve 21 and the holding sleeve 25, anelastically deformable element 36A having air permeability andcontinuous porosity, deforming the check valve 32B, an interior lidsleeve 37 that is in contact with elastically deformable element 36A andforms the gas flow passage and a disk-shaped filter 42 interposedbetween holding sleeve 25 and interior lid sleeve 37 while no guidedpart 34 and guide element 41 is provided. Each valve unit 20 is used forplural gas inlet valves 20A and gas discharge valves 20B.

Formed on both sides on the front and rear parts of the bottom ofcontainer body 1, or in other words, in the area not overlapping theprojected area of semiconductor wafers W, are round through-holes 4,respectively, as shown in FIG. 13. At the periphery of each through-hole4, a cylindrical rib 5 externally projected downwards is integrallyformed. Fixed sleeve 21, holding sleeve 25 and filter 42 in each valveunit 20 are the same as those in the above embodiment, so thatdescription is omitted.

As shown in FIG. 14, check valve 32B is formed of a predeterminedelastomer, in an approximately disk-shape, in plan view, having anapproximately H-shaped section and is fitted and mounted in the interiorbase of fixed sleeve 21 so as to cover a round vent port 23 and form asmall clearance 33 for gas flow passage between itself and the innerperipheral surface of holding sleeve 25. For the material of thisflexible check valve 32B, rubbers including melamine rubber, isoprenerubber, butyl rubber, silicone rubber and fluororubber, polyesterthermoplastic elastomer and other thermoplastic elastomers can be used.The check valve 32B side that opposes fixed sleeve 21 is appropriatelyformed with a concavo-convex surface for sealing.

When the valve unit 20 is used as gas inlet valve 20A, the check valve32B covers vent port 23 of fixed sleeve 21 by the repulsive force ofelastically deformable element 36A as shown in FIG. 15. On the otherhand, when the valve unit 20 is used as a gas discharge valve 20B, thecheck valve 32B and elastically deformable element 36A are laid upsidedown so that the check valve rests on elastically deformable element 36Aand comes into press contact with the opening periphery of interior lidsleeve 37 (see FIGS. 17 and 18).

As shown in FIG. 14, elastically deformable element 36A is given in theform of a continuous porous ring made of a predetermined foamingmaterial so as to enable communication between the interior and exteriorof container body 1, and is fitted to the interior of holding sleeve 25and rests on the outer periphery of check valve 32B while defining asmall clearance 33 for gas flow passage in cooperation with the interiorperipheral surface of holding sleeve 25. This endless elasticallydeformable element 36A is made from, for example, rubbers such asmelamine rubber, isoprene rubber, butyl rubber, silicone rubber andfluororubber, polyethylenes, elastic and permeable unwoven cloth and thelike. Because check valve 32B is compressed and deformed when operated,the degree of compressive strain is set to be low. The shape ofelastically deformable element 36A is not limited to annular forms, butmay be given in any other form, for example, in a cylindrical form,etc., as long as it can provide the necessary air permeability.

When valve unit 20 is used as a gas inlet valve 20A, the thusconstructed elastically deformable element 36A is set on the peripheryof check valve 32B as shown in FIG. 15. On the other hand, when valveunit 20 is used as a gas discharge valve 20B, the check valve 32B andelastically deformable element 36A are laid upside down so that theelastically deformable element is fitted and placed on the inner basesurface of fixed sleeve 21 (see FIGS. 17 and 18). Other components arethe same as in the above embodiment so that description is omitted.

In the above configuration, when the valve unit 20 is used as a gasinlet valve 20A and no gas such as an inert gas or the like is fed fromthe outside into the substrate storage container interior, check valve32B of gas inlet valve 20A is pressed against the interior base face offixed sleeve 21 via sealing element 35 by the repulsive force ofelastically deformable element 36A so as to close vent port 23,completing a sealed state (see FIG. 15).

In contrast, when a gas such as an inert gas etc., is fed from an airfeed nozzle 63 of a gas purge jig 60 to gas inlet valve 20A as indicatedby the arrows in FIG. 16, the pressure of the gas ejected from air feednozzle 63 urges check valve 32B of gas inlet valve 20A toward interiorlid sleeve 37, compressing elastically deformable element 36A in thesame direction, whereby the deformed check valve 32B forms clearance 33with respect to vent port 23 of fixed sleeve 21, releasing the sealedstate. This cancellation of the sealed state causes gas to flow from thesubstrate storage container exterior, passing through the clearance 33between vent port 23 of fixed sleeve 21 and check valve 32B, the gap,interior lid sleeve 37 and filter 42, in the order mentioned, into theinterior of the substrate storage container.

On the other hand, when the valve unit 20 is used as a gas dischargevalve 20B, elastically deformable element 36A of gas discharge valve 20Bpresses check valve 32B over sealing element 35 against the opening rimof interior lid sleeve 37, forming a sealed state (see FIG. 17).

In contrast, when the substrate storage container interior is filled upwith a gas as indicated by the arrows in FIG. 18, the pressure of thefilling gas presses check valve 32B of gas discharge valve 20B towardfixed sleeve 21, compressing elastically deformable element 36A in thesame direction, forming clearance 33 between deformed check valve 32Band interior lid sleeve 37 to cancel the sealed state. This cancellationof the sealed state causes gas to flow out from the substrate storagecontainer interior, passing through holding sleeve 25, filter 42,interior lid sleeve 37, the clearance 33 between check valve 32B andinterior lid sleeve 37, the gap and vent port 23 of fixed sleeve 21, inthe order mentioned, to the outside of the substrate storage container.In this case, gas purge can be efficiently done if air discharge nozzle64 of gas purge jig 60 is connected to gas discharge valve 20B so as toreduce the pressure.

Also in this embodiment, the same operation and effect as that in theabove embodiment can be expected. Besides, since guided part 34 andguide element 41 are omitted, it is obvious that a further simplifiedconfiguration can be obtained. Further, since no metal part is usedinside valve unit 20, it is possible to avoid any discharge of a traceamount of metal ions from metal parts when the substrate storagecontainer is kept in storage or washed.

Next, FIG. 19 shows the fourth embodiment of the present invention. Inthis case, a nozzle tower 43 that is connected to a valve unit 20 ismade to stand at some or all of through-holes 4 in a container body 1.

Nozzle tower 43 is basically a hollow cylinder, formed of apredetermined resin such as, for example, polycarbonate, polyetherimide,polyetheretherketone, cycloolefin polymer or the like, and has a row ofholes arranged vertically at intervals of a predetermined distance asgas ejection ports 44, on the peripheral wall thereof opposing the sideof semiconductor wafers W, whereby gas is fed from these ejection ports44 toward the semiconductor wafers W. Sectional size of these ejectionports 44 may be all equal in size or may be formed to be graduallygreater from the bottom to the top. Other components are the same asthat of the above embodiment so the description is omitted.

Also in this embodiment, the same operation and effect as that in theabove embodiment can be expected. Besides, since gas is moved frommultiple ejection ports 44 towards semiconductor wafers W, it is obviousthat stagnation inside the container body 1 can be cancelled during gasfeeding, thus making it possible to sharply reduce the time of purging.

Next, FIG. 20 shows the fifth embodiment of the present invention. Inthis case, a deflecting plate 45 is provided to stand near any ofthrough-holes 4 in a container body 1, and an elongated part 46 of thisdeflecting plate 45 is made to oppose valve unit 20 with a gaptherebetween.

Deflecting plate 45 is basically formed so as to have an approximately,inverted L-shaped section, using a predetermined resin such as, forexample, polycarbonate, polyetherimide, polyetherketone, cycloolefinpolymer and the like, and functions to guide gas flow from the valveunit 20 toward semiconductor wafers W or guide the gas in the substratestorage container to the valve unit 20. Other components are the same asthat of the above embodiment so the description is omitted.

Also in this embodiment, the same operation and effect as that in theabove embodiment can be expected. Besides, since deflecting plate 45regulates gas flow, obviously it is possible to effectively prevent gasfrom rushing onto the semiconductor wafer W held at the lower most stageand blowing particles over it, or flinging up particles.

Next, FIGS. 21 and 22 show the sixth embodiment of the presentinvention. In this case, the elastic check valve for each valve unit 20is formed of an elastic check valve 32C having an approximately U-shapedsection and fitted to a holding sleeve 25 at least leaving a clearance33 as a flow passage, and an extensible bellows 47 fitted in the checkvalve 32C in the form of a cylinder with a base, for deforming checkvalve 32C, with elastically deformable element 36A omitted.

Bellows 47 is formed in a hollow cylindrical form having flexibility andelasticity, having a multiple number of vent holes 48 for ventilationformed at intervals of a predetermined distance on its peripheral wall.This bellows is laminated to check valve 32C which is located between afixed sleeve 21 and the bottom of the peripheral wall of an interior lidsleeve 37. This bellows 47 is arranged at either the top or bottom withrespect to check valve 32C, depending on whether the valve unit 20 isused as a gas inlet valve 20A or a gas discharge valve 20B. Othercomponents are the same as in the above embodiment so that descriptionis omitted.

In the above configuration, when the valve unit 20 is used as a gasinlet valve 20A and no gas such as an inert gas or the like is fed fromthe outside into the substrate storage container interior, bellows 47 ofgas inlet valve 20A presses check valve 32C against the interior bottomface of fixed sleeve 21 so as to close a vent port 23, creating a sealedstate. Accordingly, it is possible to efficiently prevent gas fromflowing into the substrate storage container from the outside thereofand from leaking outside from the interior of the substrate storagecontainer.

On the other hand, when the valve unit 20 is used as a gas dischargevalve 20B, bellows 47 presses check valve 32C located above, against theopening bottom of interior lid sleeve 37, thus creating a sealed state.Accordingly, it is possible to efficiently prevent gas from flowing intothe substrate storage container from the outside thereof and fromleaking outside from the interior of the substrate storage container.

Also in this embodiment, the same operation and effect as that in theabove embodiment can be expected. Besides, since, instead of beingformed of a multiple number of separate parts, the elastic check valveis formed of a check valve 32C for allowing gas to flow when deformedand a bellows 47 providing a spring function, it is expected to reducethe number of parts, hence it is possible to achieve a simpleconfiguration with improved assembly performance and simplified productmanagement.

Next, FIGS. 23 and 24 show the seventh embodiment of the presentinvention. In this case, the elastic check valve for each valve unit 20is formed of an elastic check valve 32D fitted to a holding sleeve 25,leaving a clearance 33 for the flow passage and an elastic skirt body 49for check valve 32D, which is integrated with check valve 32D with a gapin between, with elastically deformable element 36A omitted.

For the material of check valve 32C and skirt body 49, rubbers includingmelamine rubber, isoprene rubber, butyl rubber, silicone rubber andfluororubber, polyester thermoplastic elastomer and other thermoplasticelastomers can be used. Formed in check valve 32D are a multiple numberof passage holes 50 for ventilation at intervals of a predetermineddistance.

The skirt body 49 is formed in a disk-like form or a cylindrical formhaving an approximate concave-top section. A thin elastic skirt piece 51is flexibly extended from the rim of the skirt body, has a hollow,approximately frustoconical shape, and is fitted on the periphery ofcheck valve 32D and integrated with it. This skirt body 49 is arrangedat either the top or bottom with respect to check valve 32D, dependingon whether the valve unit 20 is used as a gas inlet valve 20A or a gasdischarge valve 20B. Other components are the same as in the aboveembodiment so that description is omitted.

In the above configuration, when the valve unit 20 is used as a gasinlet valve 20A and no gas such as an inert gas or the like is fed fromthe outside into the substrate storage container interior, skirt body 49of gas inlet valve 20A, presses check valve 32D located below by skirtpiece 51, against the interior bottom face of fixed sleeve 21 so as toclose a vent port 23, creating a sealed state. Accordingly, it ispossible to efficiently prevent gas from flowing into the substratestorage container from the outside thereof and, from leaking outsidefrom the interior of the substrate storage container.

On the other hand, when the valve unit 20 is used as a gas dischargevalve 20B, skirt body 49 located below presses check valve 32D locatedabove, by skirt piece 51, against the opening bottom of an interior lidsleeve 37, thus creating a sealed state. Accordingly, it is possible toefficiently prevent gas from flowing into the substrate storagecontainer from the outside thereof and from leaking outside from theinterior of the substrate storage container.

Also in this embodiment, the same operation and effect as that in theabove embodiment can be expected. Besides, since the elastic check valveis formed of a check valve 32D for allowing gas to flow when deformedand a skirt body 49 providing a spring function, it is expected toreduce the number of parts, hence it is possible to achieve a simpleconfiguration with improved assembly performance and simplified productmanagement.

In the above, though engagement slots 8 are formed on the interiorperipheral surface of rim portion 7 of container body 1, these can beomitted. In this case, the interlocking mechanism for door 10 whichoperates by external control can be omitted. Further, with somemodification of the shape of the check valve 32 shown in FIGS. 10 and11, usage mode can be switched by changing the attachment position ofelastically deformable element 36 without inverting the check valve 32itself. It is also possible to provide some projections for valveopening and closing, suctioning hands and other components for theprocessing equipment for gas feed and discharge.

Next, an example of a substrate storage container of the presentinvention will be explained with a comparative example.

Using a substrate storage container having the valve units shown inFIGS. 4 and 6, the oxygen concentration was measured when the interiorof the substrate storage container was replaced by nitrogen gas whilethe retention time the low-oxygen state could be maintained wasmeasured.

From the measurement results, the system of this example, using nitrogengas at a flow rate of 20 L/min, could reach levels of 10 ppm oxygenconcentration or lower in about 15 minutes. In the examination of thechange of the oxygen concentration when the substrate storage containerwas left without any supply of nitrogen gas, it took about five hoursuntil the oxygen concentration increased up to 1%.

Thereby, it was confirmed that the low-oxygen state can be maintainedfor a fixed period when the semiconductor wafers need to be temporarilystored in the course of processing, whereby it is possible to inhibitcontamination and surface oxidation of semiconductor wafers.

In contrast to this, using a substrate storage container having theconventional valve units, the retention time the low-oxygen state couldbe maintained in the substrate storage container was measured.

Upon measurement, a pair of through-holes were formed in the bottom ofthe container body, and a piping route for measurement was prepared soas to connect these through-holes. An oximeter was interposed in thispiping route so that the oxygen concentration was measured every oneminute. The formed pair of through-holes were sealed at their periphery,and nitrogen gas was fed at a fixed rate into the substrate storagecontainer via an inlet valve. The oximeter used was of a product ofToray Engineering Co., Ltd., having a measurement rage 0.1 ppm to 100VOL %.

From the measurement result, change of the oxygen concentration afterthe substrate storage container was left without any supply of nitrogengas was examined, and it was found that the oxygen concentrationincreased to 1% after only 70 minutes or thereabouts.

INDUSTRIAL APPLICABILITY

The present invention is able to simplify the engagement structure forvalve attachment, and provides a configuration that will not allowdisplacement of the valves even with repeated use. It is also possibleto prevent sealing leakage, and hence inhibit the risk of a trace amountof discharged metal ions contaminating the substrates. Further, it ispossible to maintain the purging gas for a relatively long period, andprevent contaminants from infiltrating into the container from outside.

1. A substrate storage container including: a container body; a door foropening and closing the container body; a valve unit attached to athrough-hole formed in the bottom of the container body, for regulatingthe gas flow with respect to the container body, characterized in thatthe valve unit comprises: a fixed sleeve for gas flow, fitted in thethrough-hole; a holding sleeve for gas flow, mated with the fixedsleeve; an elastic check valve built in between the fixed sleeve and theholding sleeve; and an interior lid sleeve for gas flow, opposing theelastic check valve, and one of the fixed sleeve and the interior lidsleeve is adapted to be opened and closed by the elastic check valve, sothat gas will pass through when the elastic check valve is open whilegas will be prevented from passing when the elastic check valve isclosed; and a deflecting plate, the deflecting plate being attached inthe vicinity of the through-hole, and being formed having anapproximately L-shaped section with its longer part opposed to the valveunit with a gap therebetween.
 2. The substrate storage containeraccording to claim 1, wherein the valve unit as a gas inlet valve or gasdischarge valve is fitted to the through-hole.
 3. The substrate storagecontainer according to claim 1, wherein a rib is formed and extendedoutward from the periphery of the through-hole and the fixed sleeve isformed with a flange that is in contact with the periphery of the ribwhile the holding sleeve is formed with a flange that is in contact withthe periphery of the through-hole.
 4. The substrate storage containeraccording to claim 1, wherein a clearance for gas flow is formed atleast between the holding sleeve and the periphery of the elastic checkvalve.
 5. The substrate storage container according to claim 1, whereinthe interior lid sleeve is fitted in the holding sleeve with an airfilter interposed therebetween.
 6. The substrate storage containeraccording to claim 1, wherein the elastic check valve is at least madeup of a check valve that is built in the fixed sleeve, leaving aclearance, and an elastically deformable element interposed between thecheck valve and the interior lid sleeve, and the opening of the fixedsleeve is adapted to be opened and closed by the check valve, so thatgas will pass through when the check valve is open while gas will beprevented from passing when the check valve is closed.
 7. The substratestorage container according to claim 1, wherein the elastic check valveis at least made up of a check valve that is built in the fixed sleeve,leaving a clearance, and an elastically deformable element interposedbetween the check valve and the fixed sleeve, and the opening of theinterior lid sleeve is adapted to be opened and closed by the checkvalve, so that gas will pass through when the check valve is open whilegas will be prevented from passing when the check valve is closed. 8.The substrate storage container according claim 1, wherein the elasticcheck valve is at least made up of a check valve that is built in thefixed sleeve, leaving a clearance, and an elastically deformable elementfor the check valve, and either the check valve or the elasticallydeformable element is made in contact with the interior lid sleeve, sothat gas will pass through when the check valve is open while gas willbe prevented from passing when the check valve is closed.
 9. Thesubstrate storage container according to claim 6, wherein a guideelement is provided for either the check valve of the elastic checkvalve or the interior lid sleeve while a guided part is provided for theother, so that the guide element and the guided part fit to each otherin a slidably manner.
 10. The substrate storage container according toclaim 9, wherein the guide element is formed in the interior lid sleeveso as to have an approximately convex-top section while the guided partis formed in the check valve of the elastic check valve so as to have anapproximately concave-top section.
 11. The substrate storage containeraccording to claim 6, wherein a sealing element is attached to the checkvalve of the elastic check valve, and the sealing element is placed intodeforming contact with the opening of the fixed sleeve or the interiorlid sleeve to seal.
 12. (canceled)
 13. (canceled)
 14. The substratestorage container according claim 1, wherein the elastic check valve isat least made up of a check valve that is built in the fixed sleeve,leaving a clearance and an extensible bellows fitted in the check valve,the peripheral wall of the bellows is formed with a passage opening, andthe check valve can be opened and closed by the extension andcompression of the bellows.
 15. The substrate storage containeraccording to claim 1, wherein the elastic check valve is at least madeup of a check valve that is built in the fixed sleeve, leaving aclearance and an elastic skirt body integrated with the check valve, apassage opening is formed in the check valve, an approximatelycylindrical skirt piece is flexibly extended from the rim of the skirtbody and is fitted on the periphery of the check valve, and the checkvalve can be opened and closed by the deformation of the skirt body.